Qingkai Qian
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·Paper Publications
8. Q. Qian, Z. Zhang, M. Hua, G. Tang, J. Lei, F. Lan, Y. Xu, R. Yan, and K. J. Chen, "Enhanced dielectric deposition on single layer MoS2 with low damage using remote N2 plasma treatment," Nanotechnology 28, 175202, 2017
Release time:2022-04-03 Hits:
Translation or Not: no
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Pre One:：
7. Q. Qian, Z. Zhang, M. Hua, J. Wei, J. Lei, and K. J. Chen, "Remote N2 plasma treatment to deposit ultrathin high-k dielectric as tunneling contact layer for single-layer MoS2 MOSFET," Appl. Phys. Express 10, 125201, 2017
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Next One:：
9. Q. Qian, B. Li, M. Hua, Z. Zhang, F. Lan, Y. Xu, R. Yan, and K. J. Chen, "Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer," Sci. Rep. 6, 27676, 2016